Abstract

With current technology, the resist lithography can be implemented to fabricate microstructures with high-aspect-ratio geometries. In this work, arrays of SU-8 photoresist pillars (10x10x50 microns) on a copper substrate were patterned by X-ray (wavelength 1.24 nm) from a synchrotron source. Pattern defined silver dots on a graphite mask partially covered the substrate exposed to the X-ray. After the resist developing, the chemically stable and mechanically hardened SU-8 pillars can be used for subsequent magnetic depositions in spite of incomplete pattern in some areas of the substrate.